| Titre : | Kinetic analysis of chalcone epoxidation in a biphasic system (2011) |
| Auteurs : | Wai Wing Leung, Auteur ; Ruben M. Savizky, Auteur |
| Type de document : | Article : texte imprimé |
| Dans : | Industrial & engineering chemistry research (Vol. 49 N° 23, Décembre 2010) |
| Article en page(s) : | pp. 12327–12330 |
| Note générale : | Chimie industrielle |
| Langues : | Anglais |
| Tags : | Biphasic system Epoxidation Kinetics |
| Résumé : | The kinetics of chalcone epoxidation in a biphasic water/heptane medium system consisting of chalcone as the substrate, hydrogen peroxide as the oxidant, sodium hydroxide as the base, and dodecyltrimethylammonium bromide (DTAB) as the surfactant was investigated. The empirical rate law was established to be described as follows: rate = k[chalcone]0.74[DTAB]0.50[NaOH]0.87[H2O2]1.53. As a preliminary study, the apparent activation energy of the reaction was determined to be 25.9 kJ/mol. |
| DEWEY : | 660 |
| ISSN : | 0888-5885 |
| En ligne : | http://cat.inist.fr/?aModele=afficheN&cpsidt=23463398 |
