| Titre : | The origin of stresses in magnetron-sputtered thin films with zone T structures (2011) |
| Auteurs : | R. Daniel, Auteur ; K.J. Martinschitz, Auteur ; J. Keckes, Auteur |
| Type de document : | Article : texte imprimé |
| Dans : | Acta materialia (Vol. 58 N° 7, Avril 2010) |
| Article en page(s) : | pp. 2621–2633 |
| Note générale : | Métallurgie |
| Langues : | Anglais |
| Tags : | Cr CrN Residual stress Film growth Structure |
| Résumé : | In order to understand the origin of the residual stress state in thin films and its thickness dependence, the structure–stress relation of magnetron-sputtered Cr and CrN layers with thicknesses ranging from 100 nm to 3 μm was investigated in detail. Based on correlations between the layer-thickness-dependent grain size, texture and morphology and the magnitude of the intrinsic and thermal components of the residual stress, a model is proposed that explains the origin of internal stresses of thin polycrystalline films with zone T structures. The model was further extended for the CrN/Cr dual-layer system, where the CrN top layer is epitaxially aligned with the underlying highly (2 0 0)-oriented Cr interlayer. It is shown for the first time that both the intrinsic and thermal stress components are thickness-dependent, which is associated with the layer microstructure. |
| DEWEY : | 669 |
| ISSN : | 1359-6454 |
| En ligne : | http://www.sciencedirect.com/science/article/pii/S1359645409009069 |
