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Combined electrochemical and quantum chemical study of some diamine derivatives as corrosion inhibitors for copper / Aysel Yurt in Industrial & engineering chemistry research, Vol. 50 N° 13 (Juillet 2011) 

Public ISBD [article]  in Industrial & engineering chemistry research > Vol. 50 N° 13 (Juillet 2011) . - pp. 8073-8079 Titre : Combined electrochemical and quantum chemical study of some diamine derivatives as corrosion inhibitors for copper Type de document : texte imprimé Auteurs : Aysel Yurt, Auteur ; Gozen Bereket, Auteur Année de publication : 2011 Article en page(s) : pp. 8073-8079 Note générale : Chimie industrielle Langues : Anglais (eng) Mots-clés : Corrosion  inhibitor Résumé : The effects of 1,2-diaminoethane (DE), 1,6-diaminohexane (DH), 1,8-diaminooctane (DO), and hydrazine (H) on the electrochemical behavior of copper in 0.1 M H2SO4 were investigated using the potentiodynamic polarization and electrochemical impedance spectroscopy methods at 298 K. A significant decrease in the corrosion rate of copper was observed in the presence of the investigated inhibitors. The potentiodynamic polarization data indicated that the inhibitors were of mixed type, but the cathodic effect was more pronounced. Electrochemical measurements showed that the inhibition efficiencies increased with increasing inhibitor concentration and followed the order DO > DH > H > DE. This reveals that the inhibitive actions of the inhibitors are mainly due to adsorption on the copper surface. Adsorption of these inhibitors follows a Flory-Huggins adsorption isotherm. The correlation between the inhibition efficiencies of inhibitors and their molecular structures has been investigated using quantum chemical parameters obtained by AM1 semiempirical method. Calculated quantum chemical parameters indicate that diamine compounds are adsorbed on copper surface by chemical mechanism. DEWEY : 660 ISSN : 0888-5885 En ligne : http://cat.inist.fr/?aModele=afficheN&cpsidt=24332133 [article] Combined electrochemical and quantum chemical study of some diamine derivatives as corrosion inhibitors for copper [texte imprimé] / Aysel Yurt, Auteur ; Gozen Bereket, Auteur . - 2011 . - pp. 8073-8079. Chimie industrielle Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 50 N° 13 (Juillet 2011) . - pp. 8073-8079 Mots-clés : Corrosion  inhibitor Résumé : The effects of 1,2-diaminoethane (DE), 1,6-diaminohexane (DH), 1,8-diaminooctane (DO), and hydrazine (H) on the electrochemical behavior of copper in 0.1 M H2SO4 were investigated using the potentiodynamic polarization and electrochemical impedance spectroscopy methods at 298 K. A significant decrease in the corrosion rate of copper was observed in the presence of the investigated inhibitors. The potentiodynamic polarization data indicated that the inhibitors were of mixed type, but the cathodic effect was more pronounced. Electrochemical measurements showed that the inhibition efficiencies increased with increasing inhibitor concentration and followed the order DO > DH > H > DE. This reveals that the inhibitive actions of the inhibitors are mainly due to adsorption on the copper surface. Adsorption of these inhibitors follows a Flory-Huggins adsorption isotherm. The correlation between the inhibition efficiencies of inhibitors and their molecular structures has been investigated using quantum chemical parameters obtained by AM1 semiempirical method. Calculated quantum chemical parameters indicate that diamine compounds are adsorbed on copper surface by chemical mechanism. DEWEY : 660 ISSN : 0888-5885 En ligne : http://cat.inist.fr/?aModele=afficheN&cpsidt=24332133