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Détail de l'auteur
Auteur Gozen Bereket
Documents disponibles écrits par cet auteur
Affiner la rechercheCombined electrochemical and quantum chemical study of some diamine derivatives as corrosion inhibitors for copper / Aysel Yurt in Industrial & engineering chemistry research, Vol. 50 N° 13 (Juillet 2011)
[article]
in Industrial & engineering chemistry research > Vol. 50 N° 13 (Juillet 2011) . - pp. 8073-8079
Titre : Combined electrochemical and quantum chemical study of some diamine derivatives as corrosion inhibitors for copper Type de document : texte imprimé Auteurs : Aysel Yurt, Auteur ; Gozen Bereket, Auteur Année de publication : 2011 Article en page(s) : pp. 8073-8079 Note générale : Chimie industrielle Langues : Anglais (eng) Mots-clés : Corrosion inhibitor Résumé : The effects of 1,2-diaminoethane (DE), 1,6-diaminohexane (DH), 1,8-diaminooctane (DO), and hydrazine (H) on the electrochemical behavior of copper in 0.1 M H2SO4 were investigated using the potentiodynamic polarization and electrochemical impedance spectroscopy methods at 298 K. A significant decrease in the corrosion rate of copper was observed in the presence of the investigated inhibitors. The potentiodynamic polarization data indicated that the inhibitors were of mixed type, but the cathodic effect was more pronounced. Electrochemical measurements showed that the inhibition efficiencies increased with increasing inhibitor concentration and followed the order DO > DH > H > DE. This reveals that the inhibitive actions of the inhibitors are mainly due to adsorption on the copper surface. Adsorption of these inhibitors follows a Flory-Huggins adsorption isotherm. The correlation between the inhibition efficiencies of inhibitors and their molecular structures has been investigated using quantum chemical parameters obtained by AM1 semiempirical method. Calculated quantum chemical parameters indicate that diamine compounds are adsorbed on copper surface by chemical mechanism. DEWEY : 660 ISSN : 0888-5885 En ligne : http://cat.inist.fr/?aModele=afficheN&cpsidt=24332133 [article] Combined electrochemical and quantum chemical study of some diamine derivatives as corrosion inhibitors for copper [texte imprimé] / Aysel Yurt, Auteur ; Gozen Bereket, Auteur . - 2011 . - pp. 8073-8079.
Chimie industrielle
Langues : Anglais (eng)
in Industrial & engineering chemistry research > Vol. 50 N° 13 (Juillet 2011) . - pp. 8073-8079
Mots-clés : Corrosion inhibitor Résumé : The effects of 1,2-diaminoethane (DE), 1,6-diaminohexane (DH), 1,8-diaminooctane (DO), and hydrazine (H) on the electrochemical behavior of copper in 0.1 M H2SO4 were investigated using the potentiodynamic polarization and electrochemical impedance spectroscopy methods at 298 K. A significant decrease in the corrosion rate of copper was observed in the presence of the investigated inhibitors. The potentiodynamic polarization data indicated that the inhibitors were of mixed type, but the cathodic effect was more pronounced. Electrochemical measurements showed that the inhibition efficiencies increased with increasing inhibitor concentration and followed the order DO > DH > H > DE. This reveals that the inhibitive actions of the inhibitors are mainly due to adsorption on the copper surface. Adsorption of these inhibitors follows a Flory-Huggins adsorption isotherm. The correlation between the inhibition efficiencies of inhibitors and their molecular structures has been investigated using quantum chemical parameters obtained by AM1 semiempirical method. Calculated quantum chemical parameters indicate that diamine compounds are adsorbed on copper surface by chemical mechanism. DEWEY : 660 ISSN : 0888-5885 En ligne : http://cat.inist.fr/?aModele=afficheN&cpsidt=24332133 Cyclic Voltammetric Synthesis of poly (N - methyl pyrrole) on copper and effects of polymerization parameters on corrosion performance / Berrin Duran in Industrial & engineering chemistry research, Vol. 51 N° 14 (Avril 2012)
[article]
in Industrial & engineering chemistry research > Vol. 51 N° 14 (Avril 2012) . - pp. 5246-5255
Titre : Cyclic Voltammetric Synthesis of poly (N - methyl pyrrole) on copper and effects of polymerization parameters on corrosion performance Type de document : texte imprimé Auteurs : Berrin Duran, Auteur ; Gozen Bereket, Auteur Année de publication : 2012 Article en page(s) : pp. 5246-5255 Note générale : Industrial chemistry Langues : Anglais (eng) Mots-clés : Corrosion Polymerization Résumé : In the present work, we report the cyclic voltammetric synthesis of poly(N-methyl pyrrole) films onto copper surface from aqueous solutions of N-methyl pyrrole and oxalic acid. The effects of electropolymerization parameters (applied potential, scan rate, and cycle number) on the protective properties of poly(N-methyl pyrrole) films have been systematically investigated, and it was shown that protection efficiency strongly depends on the electrodeposition parameters. Nanoscale coatings electrodeposited at optimum electrochemical conditions were characterized by cyclic voltammetry, ex-situ attenuated total reflectance-Fourier transform infrared spectroscopy (ATR-FTIR) and scanning electron microscopy (SEM) studies. The performance of poly(N-methyl pyrrole) as protective coating against corrosion of copper in 0.1 M H2SO4 solution was assessed by electrochemical impedance spectroscopy (EIS) and anodic polarization techniques. Corrosion test results demonstrated that the poly(N-methyl pyrrole) coating has ability to protect the copper in acid rain corrosive media during 12 days and the protective behavior of the polymer film results from self-healing effect of the coating against the attack of the corrosive environment. ISSN : 0888-5885 En ligne : http://cat.inist.fr/?aModele=afficheN&cpsidt=25783434 [article] Cyclic Voltammetric Synthesis of poly (N - methyl pyrrole) on copper and effects of polymerization parameters on corrosion performance [texte imprimé] / Berrin Duran, Auteur ; Gozen Bereket, Auteur . - 2012 . - pp. 5246-5255.
Industrial chemistry
Langues : Anglais (eng)
in Industrial & engineering chemistry research > Vol. 51 N° 14 (Avril 2012) . - pp. 5246-5255
Mots-clés : Corrosion Polymerization Résumé : In the present work, we report the cyclic voltammetric synthesis of poly(N-methyl pyrrole) films onto copper surface from aqueous solutions of N-methyl pyrrole and oxalic acid. The effects of electropolymerization parameters (applied potential, scan rate, and cycle number) on the protective properties of poly(N-methyl pyrrole) films have been systematically investigated, and it was shown that protection efficiency strongly depends on the electrodeposition parameters. Nanoscale coatings electrodeposited at optimum electrochemical conditions were characterized by cyclic voltammetry, ex-situ attenuated total reflectance-Fourier transform infrared spectroscopy (ATR-FTIR) and scanning electron microscopy (SEM) studies. The performance of poly(N-methyl pyrrole) as protective coating against corrosion of copper in 0.1 M H2SO4 solution was assessed by electrochemical impedance spectroscopy (EIS) and anodic polarization techniques. Corrosion test results demonstrated that the poly(N-methyl pyrrole) coating has ability to protect the copper in acid rain corrosive media during 12 days and the protective behavior of the polymer film results from self-healing effect of the coating against the attack of the corrosive environment. ISSN : 0888-5885 En ligne : http://cat.inist.fr/?aModele=afficheN&cpsidt=25783434