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Addition of surfactant tween 80 in coating solutions for making mesoporous pure silica zeolite MFI low - k films / Hsin - Yan Lu in Industrial & engineering chemistry research, Vol. 49 N° 14 (Juillet 2010) 

Public ISBD [article]  in Industrial & engineering chemistry research > Vol. 49 N° 14 (Juillet 2010) . - pp. 6279–6286 Titre : Addition of surfactant tween 80 in coating solutions for making mesoporous pure silica zeolite MFI low - k films Type de document : texte imprimé Auteurs : Hsin - Yan Lu, Auteur ; Chin - Lin Teng, Auteur ; Chun-Wei Yu, Auteur Année de publication : 2010 Article en page(s) : pp. 6279–6286 Note générale : Industrial chemistry Langues : Anglais (eng) Mots-clés : Mesoporous  Zeolite Résumé : A mesoporous pure-silica-zeolite (PSZ) MFI low dielectric (k) film with smooth surface morphology was successfully synthesized using a centrifuged coating solution composed of a solution with PSZ MFI nanoparticles and surfactant Tween 80. The zeolite nanoparticles were prepared using TEOS as the silica source through a two-stage hydrothermal process. Both the k value and the mechanical strength of the film were strongly affected by the weight ratio of Tween 80 to TEOS and by the hydrothermal period of the second stage. When a higher weight ratio of Tween 80 to TEOS was employed, a lower k value and mechanical strength were obtained. A film coated from a solution prepared under optimal experimental conditions possessed an ultra low k value of 1.83, a hardness of 1.39 GPa, an elastic module of 12.3 GPa, and a leakage current of 1.35 × 10−7 A/cm2, all of which met the needs of the integrated circuits (IC) industry. Moreover, the occurrence of electrical degradation of electronic devices could be minimized because only few pores in the film exceeded 5 nm. ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie100203e [article] Addition of surfactant tween 80 in coating solutions for making mesoporous pure silica zeolite MFI low - k films [texte imprimé] / Hsin - Yan Lu, Auteur ; Chin - Lin Teng, Auteur ; Chun-Wei Yu, Auteur . - 2010 . - pp. 6279–6286. Industrial chemistry Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 49 N° 14 (Juillet 2010) . - pp. 6279–6286 Mots-clés : Mesoporous  Zeolite Résumé : A mesoporous pure-silica-zeolite (PSZ) MFI low dielectric (k) film with smooth surface morphology was successfully synthesized using a centrifuged coating solution composed of a solution with PSZ MFI nanoparticles and surfactant Tween 80. The zeolite nanoparticles were prepared using TEOS as the silica source through a two-stage hydrothermal process. Both the k value and the mechanical strength of the film were strongly affected by the weight ratio of Tween 80 to TEOS and by the hydrothermal period of the second stage. When a higher weight ratio of Tween 80 to TEOS was employed, a lower k value and mechanical strength were obtained. A film coated from a solution prepared under optimal experimental conditions possessed an ultra low k value of 1.83, a hardness of 1.39 GPa, an elastic module of 12.3 GPa, and a leakage current of 1.35 × 10−7 A/cm2, all of which met the needs of the integrated circuits (IC) industry. Moreover, the occurrence of electrical degradation of electronic devices could be minimized because only few pores in the film exceeded 5 nm. ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie100203e

Preparing mesoporous low - k films with high mechanical strength from noncrystalline silica particles / Hsin - Yan Lu in Industrial & engineering chemistry research, Vol. 50 N° 6 (Mars 2011) 

Public ISBD [article]  in Industrial & engineering chemistry research > Vol. 50 N° 6 (Mars 2011) . - pp. 3265-3273 Titre : Preparing mesoporous low - k films with high mechanical strength from noncrystalline silica particles Type de document : texte imprimé Auteurs : Hsin - Yan Lu, Auteur ; Chin - Lin Teng, Auteur ; Chien - Hao Kung, Auteur Année de publication : 2011 Article en page(s) : pp. 3265-3273 Note générale : Chimie industrielle Langues : Anglais (eng) Mots-clés : Strength Résumé : The coating solutions composed of surfactant Tween 80 and noncrystalline silica particles with an average size of 4.6 nm were synthesized through a short hydrothermal process. They were spun onto silicon wafers to obtain mesoporous low-k films. The film properties were compared with those of the films made of MFI zeolite nanocrystals with an average size of around 40 nm. The films from noncrystalline particles showed higher surface uniformity and higher mechanical strength, and possessed k values of smaller than 2 and low leakage current densities, which all reached the needs of the future IC industry. The preparation processes and time for the noncrystalline silica particles are much simpler and shorter than those for the MFI zeolite nanocrystals. As a result, the processes developed in this research can save the production cost and time for producing low-k films in the future. DEWEY : 660 ISSN : 0888-5885 En ligne : http://cat.inist.fr/?aModele=afficheN&cpsidt=23944493 [article] Preparing mesoporous low - k films with high mechanical strength from noncrystalline silica particles [texte imprimé] / Hsin - Yan Lu, Auteur ; Chin - Lin Teng, Auteur ; Chien - Hao Kung, Auteur . - 2011 . - pp. 3265-3273. Chimie industrielle Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 50 N° 6 (Mars 2011) . - pp. 3265-3273 Mots-clés : Strength Résumé : The coating solutions composed of surfactant Tween 80 and noncrystalline silica particles with an average size of 4.6 nm were synthesized through a short hydrothermal process. They were spun onto silicon wafers to obtain mesoporous low-k films. The film properties were compared with those of the films made of MFI zeolite nanocrystals with an average size of around 40 nm. The films from noncrystalline particles showed higher surface uniformity and higher mechanical strength, and possessed k values of smaller than 2 and low leakage current densities, which all reached the needs of the future IC industry. The preparation processes and time for the noncrystalline silica particles are much simpler and shorter than those for the MFI zeolite nanocrystals. As a result, the processes developed in this research can save the production cost and time for producing low-k films in the future. DEWEY : 660 ISSN : 0888-5885 En ligne : http://cat.inist.fr/?aModele=afficheN&cpsidt=23944493