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Modeling of advanced oxidation of trace organic contaminants by hydrogen peroxide photolysis and fenton’s reaction / Mario R. Rojas in Industrial & engineering chemistry research, Vol. 49 N° 22 (Novembre 2010) 

Public ISBD [article]  in Industrial & engineering chemistry research > Vol. 49 N° 22 (Novembre 2010) . - pp. 11331–11343 Titre : Modeling of advanced oxidation of trace organic contaminants by hydrogen peroxide photolysis and fenton’s reaction Type de document : texte imprimé Auteurs : Mario R. Rojas, Auteur ; Fernando Perez, Auteur ; Daniel Whitley, Auteur Année de publication : 2011 Article en page(s) : pp. 11331–11343 Note générale : Chimie industrielle Langues : Anglais (eng) Mots-clés : Hydrogen  Photolysis Résumé : The kinetics of nonylphenol and p-cresol destruction by hydrogen peroxide photolysis and Fenton’s reaction was investigated under a variety of operating conditions in homogeneous, laboratory-scale batch reactor experiments. Models with no adjustable parameters successfully accounted for radical initiation by photolysis of H2O2 or radical initiation by Fenton’s mechanism, reaction of organic targets with hydroxyl radical, and radical scavenging and recombination mechanisms, as well as changes in solution pH due to evolution of carbon dioxide because of target mineralization. Simulations of the UV/H2O2 and Fenton-based models can be used to anticipate the kinetics of advanced oxidation involving any target compound for which there is a known apparent second-order rate constant for reaction with hydroxyl radical. The presence of radical scavengers was successfully treated by the model, suggesting that the model can be generalized to the treatment of complex matrixes. DEWEY : 660 ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie101592p [article] Modeling of advanced oxidation of trace organic contaminants by hydrogen peroxide photolysis and fenton’s reaction [texte imprimé] / Mario R. Rojas, Auteur ; Fernando Perez, Auteur ; Daniel Whitley, Auteur . - 2011 . - pp. 11331–11343. Chimie industrielle Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 49 N° 22 (Novembre 2010) . - pp. 11331–11343 Mots-clés : Hydrogen  Photolysis Résumé : The kinetics of nonylphenol and p-cresol destruction by hydrogen peroxide photolysis and Fenton’s reaction was investigated under a variety of operating conditions in homogeneous, laboratory-scale batch reactor experiments. Models with no adjustable parameters successfully accounted for radical initiation by photolysis of H2O2 or radical initiation by Fenton’s mechanism, reaction of organic targets with hydroxyl radical, and radical scavenging and recombination mechanisms, as well as changes in solution pH due to evolution of carbon dioxide because of target mineralization. Simulations of the UV/H2O2 and Fenton-based models can be used to anticipate the kinetics of advanced oxidation involving any target compound for which there is a known apparent second-order rate constant for reaction with hydroxyl radical. The presence of radical scavengers was successfully treated by the model, suggesting that the model can be generalized to the treatment of complex matrixes. DEWEY : 660 ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie101592p