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Synthesis and Characterization of Alkali-Soluble Hyperbranched Photosensitive Polysiloxane Urethane Acrylate / Fang Sun in Industrial & engineering chemistry research, Vol. 51 N° 1 (Janvier 2012) 

Public ISBD [article]  in Industrial & engineering chemistry research > Vol. 51 N° 1 (Janvier 2012) . - pp. 240–247 Titre : Synthesis and Characterization of Alkali-Soluble Hyperbranched Photosensitive Polysiloxane Urethane Acrylate Type de document : texte imprimé Auteurs : Fang Sun, Auteur ; Xiaokang Liu, Auteur ; Lu Zhang, Auteur Année de publication : 2012 Article en page(s) : pp. 240–247 Note générale : Chimie industrielle Langues : Anglais (eng) Mots-clés : Soluble  Photosensitive  Polysiloxane Résumé : A novel alkali-soluble hyperbranched photosensitive polysiloxane urethane acrylate (AHBPSUA) was synthesized by using hyperbranched polyesters, hydroxyl-terminated polysiloxane, dimethylolpropionic acid, isophorone diisocyanate, and 2-hydroxyethyl acrylate as raw materials, and its structure was characterized by Fourier transform infrared spectroscopy, gel permeation chromatography, and 1H nuclear magnetic resonance spectroscopy. It was found that AHBPSUA possessed good compatibility with a number of acrylate monomers. The effect of photoinitiators and monomers on the photopolymerization kinetics of AHBPSUA was investigated by real-time infrared spectroscopy (RT-IR). The results showed that AHBPSUA could rapidly photopolymerize under UV irradiation in the presence of a photoinitiator and the optimal concentration of the photoinitiator (Darocur 1173) was determined as 0.1 wt %. The resin of AHBPSUA with common acrylic monomers exhibited a high polymerization rate and double-bond conversion and could form a regular image under UV irradiation through a patterned mask. The AHBPSUA system could dissolve in 1 wt % sodium carbonate solution easily and completely, and the cured coating film of the AHBPSUA system possessed excellent flexibility, toughness, and heat resistance. DEWEY : 660 ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie201095n [article] Synthesis and Characterization of Alkali-Soluble Hyperbranched Photosensitive Polysiloxane Urethane Acrylate [texte imprimé] / Fang Sun, Auteur ; Xiaokang Liu, Auteur ; Lu Zhang, Auteur . - 2012 . - pp. 240–247. Chimie industrielle Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 51 N° 1 (Janvier 2012) . - pp. 240–247 Mots-clés : Soluble  Photosensitive  Polysiloxane Résumé : A novel alkali-soluble hyperbranched photosensitive polysiloxane urethane acrylate (AHBPSUA) was synthesized by using hyperbranched polyesters, hydroxyl-terminated polysiloxane, dimethylolpropionic acid, isophorone diisocyanate, and 2-hydroxyethyl acrylate as raw materials, and its structure was characterized by Fourier transform infrared spectroscopy, gel permeation chromatography, and 1H nuclear magnetic resonance spectroscopy. It was found that AHBPSUA possessed good compatibility with a number of acrylate monomers. The effect of photoinitiators and monomers on the photopolymerization kinetics of AHBPSUA was investigated by real-time infrared spectroscopy (RT-IR). The results showed that AHBPSUA could rapidly photopolymerize under UV irradiation in the presence of a photoinitiator and the optimal concentration of the photoinitiator (Darocur 1173) was determined as 0.1 wt %. The resin of AHBPSUA with common acrylic monomers exhibited a high polymerization rate and double-bond conversion and could form a regular image under UV irradiation through a patterned mask. The AHBPSUA system could dissolve in 1 wt % sodium carbonate solution easily and completely, and the cured coating film of the AHBPSUA system possessed excellent flexibility, toughness, and heat resistance. DEWEY : 660 ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie201095n