Article : texte imprimé

Enhanced wet - chemical etching to prepare patterned silicon mask with controlled depths by combining photolithography with galvanic reaction

Nannan Sun, Auteur ; Jianming Chen, Auteur ; Chao Jiang, Auteur |

Dans Industrial & engineering chemistry research (Vol. 51 N° 2, Janvier 2012)

We have developed an enhanced wet-chemical method to prepare patterned silicon templates with controlled depths at microscale by combining photolithography with electroless metal etching. The silicon masks are obtained in the following procedure[...]

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