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Interface thermodynamics of ultra-thin, amorphous oxide overgrowths on AlMg alloys / E. Panda in Acta materialia, Vol. 58 N° 5 (Mars 2010) 

Public ISBD [article]  in Acta materialia > Vol. 58 N° 5 (Mars 2010) . - pp. 1770–1781 Titre : Interface thermodynamics of ultra-thin, amorphous oxide overgrowths on AlMg alloys Type de document : texte imprimé Auteurs : E. Panda, Auteur ; L.P.H. Jeurgens, Auteur ; E. J. Mittemeijer, Auteur Année de publication : 2011 Article en page(s) : pp. 1770–1781 Note générale : Métallurgie Langues : Anglais (eng) Mots-clés : Interface  energy  Thermodynamics  Alloy  oxidation  Amorphous  oxides  Ultra-thin  oxide  films Résumé : A thermodynamic model has been presented for the prediction of the type of initial, amorphous oxide overgrowth (i.e. am-Al2O3, am-MgO or am-MgAl2O4) on bare AlMg substrates as a function of the Mg alloying element content at the substrate/oxide interface, the growth temperature and the oxide-film thickness (up to 5 nm). On the basis of the macroscopic atom approach, expressions have been derived for the estimation of the energies of the interfaces between the AlMg substrate and the competing am-Al2O3, am-MgO and am-MgAl2O4 overgrowths. For all cases a strong driving force has been revealed for the interfacial (chemical) segregation of Mg. am-Al2O3 was found to be the most stable amorphous oxide phase on the AlMg substrate for T < 610 K; its relatively high stability is governed by a relatively low interface energy. The model predictions are in good agreement with corresponding experimental results on the chemical constitution of ultra-thin amorphous oxide films grown on Al- and Mg-based alloy substrates in the temperature range of 300–400 K. DEWEY : 669 ISSN : 1359-6454 En ligne : http://www.sciencedirect.com/science/article/pii/S1359645409007988 [article] Interface thermodynamics of ultra-thin, amorphous oxide overgrowths on AlMg alloys [texte imprimé] / E. Panda, Auteur ; L.P.H. Jeurgens, Auteur ; E. J. Mittemeijer, Auteur . - 2011 . - pp. 1770–1781. Métallurgie Langues : Anglais (eng) in Acta materialia > Vol. 58 N° 5 (Mars 2010) . - pp. 1770–1781 Mots-clés : Interface  energy  Thermodynamics  Alloy  oxidation  Amorphous  oxides  Ultra-thin  oxide  films Résumé : A thermodynamic model has been presented for the prediction of the type of initial, amorphous oxide overgrowth (i.e. am-Al2O3, am-MgO or am-MgAl2O4) on bare AlMg substrates as a function of the Mg alloying element content at the substrate/oxide interface, the growth temperature and the oxide-film thickness (up to 5 nm). On the basis of the macroscopic atom approach, expressions have been derived for the estimation of the energies of the interfaces between the AlMg substrate and the competing am-Al2O3, am-MgO and am-MgAl2O4 overgrowths. For all cases a strong driving force has been revealed for the interfacial (chemical) segregation of Mg. am-Al2O3 was found to be the most stable amorphous oxide phase on the AlMg substrate for T < 610 K; its relatively high stability is governed by a relatively low interface energy. The model predictions are in good agreement with corresponding experimental results on the chemical constitution of ultra-thin amorphous oxide films grown on Al- and Mg-based alloy substrates in the temperature range of 300–400 K. DEWEY : 669 ISSN : 1359-6454 En ligne : http://www.sciencedirect.com/science/article/pii/S1359645409007988