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The origin of stresses in magnetron-sputtered thin films with zone T structures / R. Daniel in Acta materialia, Vol. 58 N° 7 (Avril 2010) 

Public ISBD [article]  in Acta materialia > Vol. 58 N° 7 (Avril 2010) . - pp. 2621–2633 Titre : The origin of stresses in magnetron-sputtered thin films with zone T structures Type de document : texte imprimé Auteurs : R. Daniel, Auteur ; K.J. Martinschitz, Auteur ; J. Keckes, Auteur Année de publication : 2011 Article en page(s) : pp. 2621–2633 Note générale : Métallurgie Langues : Anglais (eng) Mots-clés : Cr  CrN  Residual  stress  Film  growth  Structure Résumé : In order to understand the origin of the residual stress state in thin films and its thickness dependence, the structure–stress relation of magnetron-sputtered Cr and CrN layers with thicknesses ranging from 100 nm to 3 μm was investigated in detail. Based on correlations between the layer-thickness-dependent grain size, texture and morphology and the magnitude of the intrinsic and thermal components of the residual stress, a model is proposed that explains the origin of internal stresses of thin polycrystalline films with zone T structures. The model was further extended for the CrN/Cr dual-layer system, where the CrN top layer is epitaxially aligned with the underlying highly (2 0 0)-oriented Cr interlayer. It is shown for the first time that both the intrinsic and thermal stress components are thickness-dependent, which is associated with the layer microstructure. DEWEY : 669 ISSN : 1359-6454 En ligne : http://www.sciencedirect.com/science/article/pii/S1359645409009069 [article] The origin of stresses in magnetron-sputtered thin films with zone T structures [texte imprimé] / R. Daniel, Auteur ; K.J. Martinschitz, Auteur ; J. Keckes, Auteur . - 2011 . - pp. 2621–2633. Métallurgie Langues : Anglais (eng) in Acta materialia > Vol. 58 N° 7 (Avril 2010) . - pp. 2621–2633 Mots-clés : Cr  CrN  Residual  stress  Film  growth  Structure Résumé : In order to understand the origin of the residual stress state in thin films and its thickness dependence, the structure–stress relation of magnetron-sputtered Cr and CrN layers with thicknesses ranging from 100 nm to 3 μm was investigated in detail. Based on correlations between the layer-thickness-dependent grain size, texture and morphology and the magnitude of the intrinsic and thermal components of the residual stress, a model is proposed that explains the origin of internal stresses of thin polycrystalline films with zone T structures. The model was further extended for the CrN/Cr dual-layer system, where the CrN top layer is epitaxially aligned with the underlying highly (2 0 0)-oriented Cr interlayer. It is shown for the first time that both the intrinsic and thermal stress components are thickness-dependent, which is associated with the layer microstructure. DEWEY : 669 ISSN : 1359-6454 En ligne : http://www.sciencedirect.com/science/article/pii/S1359645409009069