Documents disponibles écrits par cet auteur

Investigation of the low-cycle fatigue mechanism for micron-scale monocrystalline silicon films / E. K. Baumert in Acta materialia, Vol. 58 N° 8 (Mai 2010) 

Public ISBD [article]  in Acta materialia > Vol. 58 N° 8 (Mai 2010) . - pp. 2854–2863 Titre : Investigation of the low-cycle fatigue mechanism for micron-scale monocrystalline silicon films Type de document : texte imprimé Auteurs : E. K. Baumert, Auteur ; P.-O. Theillet, Auteur ; O.N. Pierron, Auteur Année de publication : 2011 Article en page(s) : pp. 2854–2863 Note générale : Métallurgie Langues : Anglais (eng) Mots-clés : Fatigue  Monocrystalline  silicon  Thin  film  Static  fatigue  Frequency  effects Résumé : This study investigated the cyclic and static fatigue properties of 10 μm thick, deep reactive ion etched, monocrystalline silicon films. Stress–life fatigue curves and fatigue degradation rates vs. stress curves were generated at both 4 and 40 kHz, at 30 °C, 50% relative humidity (RH). A significant frequency effect was observed, with shorter fatigue lives and faster damage accumulation rates at 4 kHz. Static fatigue was also observed with shorter static lifetimes at 80 °C, 90% RH than at 30 °C, 50% RH. Fracture surface evaluation did not reveal any major difference between cyclically and statically fatigued devices. These experimental results confirm that the fatigue of micron-scale silicon is not purely mechanical. The study also proposes a fatigue scenario based on time-dependent subcritical crack growth to account for the low-cycle fatigue regime. DEWEY : 669 ISSN : 1359-6454 En ligne : http://www.sciencedirect.com/science/article/pii/S135964541000025X [article] Investigation of the low-cycle fatigue mechanism for micron-scale monocrystalline silicon films [texte imprimé] / E. K. Baumert, Auteur ; P.-O. Theillet, Auteur ; O.N. Pierron, Auteur . - 2011 . - pp. 2854–2863. Métallurgie Langues : Anglais (eng) in Acta materialia > Vol. 58 N° 8 (Mai 2010) . - pp. 2854–2863 Mots-clés : Fatigue  Monocrystalline  silicon  Thin  film  Static  fatigue  Frequency  effects Résumé : This study investigated the cyclic and static fatigue properties of 10 μm thick, deep reactive ion etched, monocrystalline silicon films. Stress–life fatigue curves and fatigue degradation rates vs. stress curves were generated at both 4 and 40 kHz, at 30 °C, 50% relative humidity (RH). A significant frequency effect was observed, with shorter fatigue lives and faster damage accumulation rates at 4 kHz. Static fatigue was also observed with shorter static lifetimes at 80 °C, 90% RH than at 30 °C, 50% RH. Fracture surface evaluation did not reveal any major difference between cyclically and statically fatigued devices. These experimental results confirm that the fatigue of micron-scale silicon is not purely mechanical. The study also proposes a fatigue scenario based on time-dependent subcritical crack growth to account for the low-cycle fatigue regime. DEWEY : 669 ISSN : 1359-6454 En ligne : http://www.sciencedirect.com/science/article/pii/S135964541000025X