Removal mechanism of thiophenic compounds in model oil by inorganic lewis acids / Jia-jun Gao in Industrial & engineering chemistry research, Vol. 51 N° 12 (Mars 2012)  

Public ISBD [article]  inIndustrial & engineering chemistry research > Vol. 51 N° 12 (Mars 2012) . - pp. 4682–4691 Titre : Removal mechanism of thiophenic compounds in model oil by inorganic lewis acids Type de document : texte imprimé Auteurs : Jia-jun Gao, Auteur ; Hong-qiang Li, Auteur ; Hong - Xing Zhang, Auteur Année de publication : 2012 Article en page(s) : pp. 4682–4691 Note générale : Chimie industrielle Langues : Anglais (eng) Mots-clés : Adsorption Inorganic lewis Résumé : The adsorptive desulfurization ability of four inorganic Lewis acids (AlCl3, FeCl3, ZnCl2, and CuCl) for three thiophenic S-compounds, viz., 3-methylthiophene (3-MT), benzothiophene (BT), and dibenzothiophene (DBT), from their model oils were studied here experimentally at 290 K. The results were explained in terms of the theory of hard and soft acids and bases (HSAB) reasonably. The results show that AlCl3 has excellent removal ability for 3-MT with its adsorbance being 141.4 without toluene and 123.0 mgS/g with 25 wt % toluene. It is noteworthy that 3-MT is removed solely through complexing adsorption; in contrast, BT is adsorbed, accompanied with the formation of oil soluble BT oligomers under catalysis of AlCl3 which can promote the complexation greatly. Further, the addition of benzene and toluene can accelerate the desulfurization rate of 3-MT and BT due to the concentration of aromatics on the adsorbent and the oligomerization between BT and the aromatics. ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie202831p [article] Removal mechanism of thiophenic compounds in model oil by inorganic lewis acids [texte imprimé] / Jia-jun Gao, Auteur ; Hong-qiang Li, Auteur ; Hong - Xing Zhang, Auteur . - 2012 . - pp. 4682–4691. Chimie industrielle Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 51 N° 12 (Mars 2012) . - pp. 4682–4691 Mots-clés : Adsorption Inorganic lewis Résumé : The adsorptive desulfurization ability of four inorganic Lewis acids (AlCl3, FeCl3, ZnCl2, and CuCl) for three thiophenic S-compounds, viz., 3-methylthiophene (3-MT), benzothiophene (BT), and dibenzothiophene (DBT), from their model oils were studied here experimentally at 290 K. The results were explained in terms of the theory of hard and soft acids and bases (HSAB) reasonably. The results show that AlCl3 has excellent removal ability for 3-MT with its adsorbance being 141.4 without toluene and 123.0 mgS/g with 25 wt % toluene. It is noteworthy that 3-MT is removed solely through complexing adsorption; in contrast, BT is adsorbed, accompanied with the formation of oil soluble BT oligomers under catalysis of AlCl3 which can promote the complexation greatly. Further, the addition of benzene and toluene can accelerate the desulfurization rate of 3-MT and BT due to the concentration of aromatics on the adsorbent and the oligomerization between BT and the aromatics. ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie202831p

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