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Selective area chemical - deposition process / Manoj Kumar in Industrial & engineering chemistry research, Vol. 51 N° 34 (Août 2012) 

Public ISBD [article]  in Industrial & engineering chemistry research > Vol. 51 N° 34 (Août 2012) . - pp. 11147-11156 Titre : Selective area chemical - deposition process : An innovative and facile route to prepare 147Pm sources for dust monitors Type de document : texte imprimé Auteurs : Manoj Kumar, Auteur ; Rakesh Shukla, Auteur ; Shyamala S. Gandhi, Auteur Année de publication : 2012 Article en page(s) : pp. 11147-11156 Note générale : Industrial chemistry Langues : Anglais (eng) Mots-clés : Surveillance  Dust Résumé : The potential utility of selective area chemical-deposition technique in the preparation of 147Pm source for the measurement of particulate emission in air was demonstrated. The process consists of electrodeposition of Ni on a precisely defined surface area of a copper wire followed by deposition of 147Pm activity from an aqueous solution. The influences of various experimental parameters such as pH of the aqueous solution, deposition time and reaction volume were systematically investigated for the optimum deposition of 147Pm. To prevent leaching of 147Pm from the source, we subsequently sheathed the radioactive area with a thin layer of polystyrene. The deposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), and atomic force microscopy (AFM) analyses. The quality of the prepared sources in compliance with regulatory norms were evaluated to ensure their safety during application and found to be satisfactory. ISSN : 0888-5885 En ligne : http://cat.inist.fr/?aModele=afficheN&cpsidt=26299440 [article] Selective area chemical - deposition process : An innovative and facile route to prepare 147Pm sources for dust monitors [texte imprimé] / Manoj Kumar, Auteur ; Rakesh Shukla, Auteur ; Shyamala S. Gandhi, Auteur . - 2012 . - pp. 11147-11156. Industrial chemistry Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 51 N° 34 (Août 2012) . - pp. 11147-11156 Mots-clés : Surveillance  Dust Résumé : The potential utility of selective area chemical-deposition technique in the preparation of 147Pm source for the measurement of particulate emission in air was demonstrated. The process consists of electrodeposition of Ni on a precisely defined surface area of a copper wire followed by deposition of 147Pm activity from an aqueous solution. The influences of various experimental parameters such as pH of the aqueous solution, deposition time and reaction volume were systematically investigated for the optimum deposition of 147Pm. To prevent leaching of 147Pm from the source, we subsequently sheathed the radioactive area with a thin layer of polystyrene. The deposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), and atomic force microscopy (AFM) analyses. The quality of the prepared sources in compliance with regulatory norms were evaluated to ensure their safety during application and found to be satisfactory. ISSN : 0888-5885 En ligne : http://cat.inist.fr/?aModele=afficheN&cpsidt=26299440