Article : texte imprimé

Selective area chemical - deposition process : An innovative and facile route to prepare 147Pm sources for dust monitors

Manoj Kumar, Auteur ; Rakesh Shukla, Auteur ; Shyamala S. Gandhi, Auteur |

Dans Industrial & engineering chemistry research (Vol. 51 N° 34, Août 2012)

The potential utility of selective area chemical-deposition technique in the preparation of 147Pm source for the measurement of particulate emission in air was demonstrated. The process consists of electrodeposition of Ni on a precisely defined [...]

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