Article : texte imprimé

Deposition of alumina thin film by dual magnetron sputtering : Is it γ-Al2O3?

W. Engelhart, Auteur ; W. Dreher, Auteur ; O. Eibl, Auteur |

Dans Acta materialia (Vol. 59 N° 20, Décembre 2011)

Alumina thin films were deposited by reactive dual magnetron sputtering at 550 °C on cemented carbide substrates. A Young’s modulus of 315 GPa and a Vickers hardness of 2348 were determined by nanoindentation and were compared to reference mater[...]

Plus d'information...

Ajouter un tag

En ligne

---

1 (1 - 1 / 1) Par page : 25 50 100 200