Documents disponibles écrits par cet auteur

Adsorption features of phthalates and organophosphorus compounds on silicon wafers / Sabrine Tlili in Industrial & engineering chemistry research, Vol. 51 N° 45 (Novembre 2012) 

Public ISBD [article]  in Industrial & engineering chemistry research > Vol. 51 N° 45 (Novembre 2012) . - pp. 14665–14672 Titre : Adsorption features of phthalates and organophosphorus compounds on silicon wafers Type de document : texte imprimé Auteurs : Sabrine Tlili, Auteur ; Nathalie Hayeck, Auteur ; Sasho Gligorovski, Auteur Année de publication : 2013 Article en page(s) : pp. 14665–14672 Note générale : Industrial chemistry Langues : Anglais (eng) Mots-clés : Adsorption  Phthalates Résumé : Short-time adsorption and desorption behavior of three high-boiling point organic contaminants, diethyl phthalate (DEP), tri-(2-chloroethyl)-phosphate (TCEP), and tri-(2-cloropropyl)-phosphate (TCPP), on silicon wafer surface were investigated. Adsorption constants kads and desorption constants kdes were experimentally measured. Comparing the obtained kinetic parameters, the time-dependent changes in their surface concentrations were found to be governed by desorption constants. The adsorption and desorption constants were also measured as a function of temperature. Subsequently, a series of time-dependent surface concentrations of DEP, TCEP, and TCPP were simulated under various ambient concentrations. Finally, an estimation of the maximum allowable wafer exposure according to the International Technology Roadmap for Semiconductors (ITRS) was performed. The results of this study can provide information to better control organic contamination and to meet requirements of the microelectronic devices qualities. ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie301501b [article] Adsorption features of phthalates and organophosphorus compounds on silicon wafers [texte imprimé] / Sabrine Tlili, Auteur ; Nathalie Hayeck, Auteur ; Sasho Gligorovski, Auteur . - 2013 . - pp. 14665–14672. Industrial chemistry Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 51 N° 45 (Novembre 2012) . - pp. 14665–14672 Mots-clés : Adsorption  Phthalates Résumé : Short-time adsorption and desorption behavior of three high-boiling point organic contaminants, diethyl phthalate (DEP), tri-(2-chloroethyl)-phosphate (TCEP), and tri-(2-cloropropyl)-phosphate (TCPP), on silicon wafer surface were investigated. Adsorption constants kads and desorption constants kdes were experimentally measured. Comparing the obtained kinetic parameters, the time-dependent changes in their surface concentrations were found to be governed by desorption constants. The adsorption and desorption constants were also measured as a function of temperature. Subsequently, a series of time-dependent surface concentrations of DEP, TCEP, and TCPP were simulated under various ambient concentrations. Finally, an estimation of the maximum allowable wafer exposure according to the International Technology Roadmap for Semiconductors (ITRS) was performed. The results of this study can provide information to better control organic contamination and to meet requirements of the microelectronic devices qualities. ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie301501b