Auteur Ivan C. Lee
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Nageswara Rao Peela, Auteur ; Ivan C. Lee, Auteur ; Dionisios G. Vlachos, Auteur |The effect of distributor and channel positions on flow uniformity in a high-throughput reactor is studied using a COMSOL MULTIPHYSICS, CFD package. The best design is subsequently fabricated and evaluated for propane total oxidation reaction at[...]
