Photodegradation of sulfadiazine by goethite - oxalates uspension under UV light irradiation / Yan Wang in Industrial & engineering chemistry research, Vol. 49 N° 8 (Avril 2010)  

Public ISBD [article]  inIndustrial & engineering chemistry research > Vol. 49 N° 8 (Avril 2010) . - pp. 3527–3532 Titre : Photodegradation of sulfadiazine by goethite - oxalates uspension under UV light irradiation Type de document : texte imprimé Auteurs : Yan Wang, Auteur ; juan boo Liang, Auteur ; xin di Liao, Auteur Année de publication : 2010 Article en page(s) : pp. 3527–3532 Note générale : Industrial chemistry Langues : Anglais (eng) Mots-clés : Photodegradation UV light Résumé : Sulfadiazine, a potent antibacterial agent belonging to the group of antibiotics called sulfonamides, has been reported to be present in surface and groundwater. This study investigated the degradation of sulfadiazine in a goethite (α-FeOOH)−oxalate Fenton-like system under UV irradiation. The results showed that sulfadiazine could be effectively photodegraded by the goethite−oxalate Fenton-like system as a result of the formation of the highly oxidizing hydroxyl radicals, •OH. Among the iron oxides tested (α-FeOOH, γ-Fe2O3, γ-FeOOH, and α-Fe2O3), α-FeOOH was found to be the most effective. Degradation of sulfadiazine depended significantly on the pH and initial concentration of oxalic acid in the system, with optimal values of 3.5 and 4.0 mM, respectively, under UV irradiation. Five intermediate products of sulfadiazine degradation were identified using high-performance liquid chromatography−mass spectrometry (HPLC−MS), gas chromatography−mass spectrometry (GC−MS), and ion chromatography (IC), and a possible sulfadiazine degradation pathway in such a system was proposed. Organic sulfur and organic nitrogen mineralization were also observed, and the results indicated that cleavage of the sulfonylurea bridge was easier than the other potential cleavage bonds under the goethite−oxalate system. In addition, results from Biolog assays suggested that the ecological toxicity of the sulfadiazine solution was effectively reduced after degradation. En ligne : http://pubs.acs.org/doi/abs/10.1021/ie9014974 [article] Photodegradation of sulfadiazine by goethite - oxalates uspension under UV light irradiation [texte imprimé] / Yan Wang, Auteur ; juan boo Liang, Auteur ; xin di Liao, Auteur . - 2010 . - pp. 3527–3532. Industrial chemistry Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 49 N° 8 (Avril 2010) . - pp. 3527–3532 Mots-clés : Photodegradation UV light Résumé : Sulfadiazine, a potent antibacterial agent belonging to the group of antibiotics called sulfonamides, has been reported to be present in surface and groundwater. This study investigated the degradation of sulfadiazine in a goethite (α-FeOOH)−oxalate Fenton-like system under UV irradiation. The results showed that sulfadiazine could be effectively photodegraded by the goethite−oxalate Fenton-like system as a result of the formation of the highly oxidizing hydroxyl radicals, •OH. Among the iron oxides tested (α-FeOOH, γ-Fe2O3, γ-FeOOH, and α-Fe2O3), α-FeOOH was found to be the most effective. Degradation of sulfadiazine depended significantly on the pH and initial concentration of oxalic acid in the system, with optimal values of 3.5 and 4.0 mM, respectively, under UV irradiation. Five intermediate products of sulfadiazine degradation were identified using high-performance liquid chromatography−mass spectrometry (HPLC−MS), gas chromatography−mass spectrometry (GC−MS), and ion chromatography (IC), and a possible sulfadiazine degradation pathway in such a system was proposed. Organic sulfur and organic nitrogen mineralization were also observed, and the results indicated that cleavage of the sulfonylurea bridge was easier than the other potential cleavage bonds under the goethite−oxalate system. In addition, results from Biolog assays suggested that the ecological toxicity of the sulfadiazine solution was effectively reduced after degradation. En ligne : http://pubs.acs.org/doi/abs/10.1021/ie9014974

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