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Degradation of poly(ethylene glycol) in aqueous solution by photo-fenton and H2O2/UV processes / Jeanne A. Giroto in Industrial & engineering chemistry research, Vol. 49 N° 7 (Avril 2010) 

Public ISBD [article]  in Industrial & engineering chemistry research > Vol. 49 N° 7 (Avril 2010) Titre : Degradation of poly(ethylene glycol) in aqueous solution by photo-fenton and H2O2/UV processes Type de document : texte imprimé Auteurs : Jeanne A. Giroto, Auteur ; Antonio C. S. C. Teixeira, Auteur ; Claudio A. O. Nascimento, Auteur Année de publication : 2010 Note générale : Industrial Chemistry Langues : Anglais (eng) Mots-clés : Poly  ethylene  glycol  Aqueous  Solution  Photo-Fenton  H2O2/UV Résumé : This article reports experimental results obtained in a laboratory-scale photochemical reactor on the photodegradation of poly(ethylene glycol) (PEG) in aqueous solutions by means of the photo-Fenton and H2O2/UV processes. Dilute water solutions of PEG were fed to a batch reactor, mixed with pertinent reactants, and allowed to react under different conditions. Reaction progress was evaluated by sampling and analyzing the concentration of the total organic carbon (TOC) in solution as a function of the reaction time. Organic acids formed during oxidation were determined by HPLC analyses. The main acids detected in both processes were acetic and formic. Glycolic acid was detected only in the photo-Fenton process, and malonic acid was detected only in the H2O2/UV treatment, indicating that different reaction paths occur in these processes. The characteristics of both processes are discussed, based on the evolution of the TOC−time curves and the concentration profiles of the monitored organic acids. The experimental results constitute a contribution to the design of industrial processes for the treatment of wastewaters containing soluble polymers with similar properties. ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie9015792 [article] Degradation of poly(ethylene glycol) in aqueous solution by photo-fenton and H2O2/UV processes [texte imprimé] / Jeanne A. Giroto, Auteur ; Antonio C. S. C. Teixeira, Auteur ; Claudio A. O. Nascimento, Auteur . - 2010. Industrial Chemistry Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 49 N° 7 (Avril 2010) Mots-clés : Poly  ethylene  glycol  Aqueous  Solution  Photo-Fenton  H2O2/UV Résumé : This article reports experimental results obtained in a laboratory-scale photochemical reactor on the photodegradation of poly(ethylene glycol) (PEG) in aqueous solutions by means of the photo-Fenton and H2O2/UV processes. Dilute water solutions of PEG were fed to a batch reactor, mixed with pertinent reactants, and allowed to react under different conditions. Reaction progress was evaluated by sampling and analyzing the concentration of the total organic carbon (TOC) in solution as a function of the reaction time. Organic acids formed during oxidation were determined by HPLC analyses. The main acids detected in both processes were acetic and formic. Glycolic acid was detected only in the photo-Fenton process, and malonic acid was detected only in the H2O2/UV treatment, indicating that different reaction paths occur in these processes. The characteristics of both processes are discussed, based on the evolution of the TOC−time curves and the concentration profiles of the monitored organic acids. The experimental results constitute a contribution to the design of industrial processes for the treatment of wastewaters containing soluble polymers with similar properties. ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie9015792