Addition of surfactant tween 80 in coating solutions for making mesoporous pure silica zeolite MFI low - k films / Hsin - Yan Lu in Industrial & engineering chemistry research, Vol. 49 N° 14 (Juillet 2010)  

Public ISBD [article]  inIndustrial & engineering chemistry research > Vol. 49 N° 14 (Juillet 2010) . - pp. 6279–6286 Titre : Addition of surfactant tween 80 in coating solutions for making mesoporous pure silica zeolite MFI low - k films Type de document : texte imprimé Auteurs : Hsin - Yan Lu, Auteur ; Chin - Lin Teng, Auteur ; Chun-Wei Yu, Auteur Année de publication : 2010 Article en page(s) : pp. 6279–6286 Note générale : Industrial chemistry Langues : Anglais (eng) Mots-clés : Mesoporous Zeolite Résumé : A mesoporous pure-silica-zeolite (PSZ) MFI low dielectric (k) film with smooth surface morphology was successfully synthesized using a centrifuged coating solution composed of a solution with PSZ MFI nanoparticles and surfactant Tween 80. The zeolite nanoparticles were prepared using TEOS as the silica source through a two-stage hydrothermal process. Both the k value and the mechanical strength of the film were strongly affected by the weight ratio of Tween 80 to TEOS and by the hydrothermal period of the second stage. When a higher weight ratio of Tween 80 to TEOS was employed, a lower k value and mechanical strength were obtained. A film coated from a solution prepared under optimal experimental conditions possessed an ultra low k value of 1.83, a hardness of 1.39 GPa, an elastic module of 12.3 GPa, and a leakage current of 1.35 × 10−7 A/cm2, all of which met the needs of the integrated circuits (IC) industry. Moreover, the occurrence of electrical degradation of electronic devices could be minimized because only few pores in the film exceeded 5 nm. ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie100203e [article] Addition of surfactant tween 80 in coating solutions for making mesoporous pure silica zeolite MFI low - k films [texte imprimé] / Hsin - Yan Lu, Auteur ; Chin - Lin Teng, Auteur ; Chun-Wei Yu, Auteur . - 2010 . - pp. 6279–6286. Industrial chemistry Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 49 N° 14 (Juillet 2010) . - pp. 6279–6286 Mots-clés : Mesoporous Zeolite Résumé : A mesoporous pure-silica-zeolite (PSZ) MFI low dielectric (k) film with smooth surface morphology was successfully synthesized using a centrifuged coating solution composed of a solution with PSZ MFI nanoparticles and surfactant Tween 80. The zeolite nanoparticles were prepared using TEOS as the silica source through a two-stage hydrothermal process. Both the k value and the mechanical strength of the film were strongly affected by the weight ratio of Tween 80 to TEOS and by the hydrothermal period of the second stage. When a higher weight ratio of Tween 80 to TEOS was employed, a lower k value and mechanical strength were obtained. A film coated from a solution prepared under optimal experimental conditions possessed an ultra low k value of 1.83, a hardness of 1.39 GPa, an elastic module of 12.3 GPa, and a leakage current of 1.35 × 10−7 A/cm2, all of which met the needs of the integrated circuits (IC) industry. Moreover, the occurrence of electrical degradation of electronic devices could be minimized because only few pores in the film exceeded 5 nm. ISSN : 0888-5885 En ligne : http://pubs.acs.org/doi/abs/10.1021/ie100203e

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