Article : texte imprimé

Kinetic modeling of temperature dependence of TiCl4 and NH3 surface reaction in trap systems for CVD reactors

Changhyun Pang, Auteur ; Donghun Jeong, Auteur ; Heeyeop Chae, Auteur |

Dans Industrial & engineering chemistry research (Vol. 48 N°3, Février 2009)

The chemical vapor deposition (CVD) of titanium nitride (TiN) thin film has been a widely adopted process for the fabrication of diffusion barrier layers in microelectronic fabrication processes. TiCl4(NH3)2 is known to be formed as a solid pr[...]

Plus d'information...

Ajouter un tag

En ligne

---

1 (1 - 1 / 1) Par page : 25 50 100 200