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Aqueous metronidazole degradation by UV/H2O2 process in single-and multi-lamp tubular photoreactors / Melody Blythe Johnson in Industrial & engineering chemistry research, Vol. 47 N°17 (Septembre 2008) 

Public ISBD [article]  in Industrial & engineering chemistry research > Vol. 47 N°17 (Septembre 2008) . - p. 6525–6537 Titre : Aqueous metronidazole degradation by UV/H2O2 process in single-and multi-lamp tubular photoreactors : kinetics and reactor design Type de document : texte imprimé Auteurs : Melody Blythe Johnson, Auteur ; Mehrab Mehrvar, Auteur Année de publication : 2008 Article en page(s) : p. 6525–6537 Note générale : Chemical engineering Langues : Anglais (eng) Mots-clés : Aqueous  metronidazole  Kinetic  model  UV/H2O2  process Résumé : A kinetic model was developed to predict the removal of aqueous metronidazole utilizing the UV/H2O2 process. The rate constant for the reaction between metronidazole and hydroxyl radicals was determined to be 1.98 × 109 M−1 s−1. The model was able to predict an optimal initial H2O2 dose and the inhibitory effects of high H2O2 doses and bicarbonate ions in the aqueous solution. Simulations were performed for three different photoreactors treating a 6 μM solution of metronidazole at various influent H2O2 doses and photoreactor radii. The predicted removal rates of metronidazole were 4.9−13% and 14−41% for the single-lamp and multilamp photoreactors, respectively. Selection of a photoreactor radius for maximum metronidazole removal varied with influent H2O2 concentration. The lowest operational cost of $0.05 per mmol removed was projected for the multilamp photoreactor. Operationally, it was cost-effective to utilize higher UV lamp output (36W), while keeping influent H2O2 concentration low (25 mg/L). En ligne : http://pubs.acs.org/doi/abs/10.1021/ie071637v [article] Aqueous metronidazole degradation by UV/H2O2 process in single-and multi-lamp tubular photoreactors : kinetics and reactor design [texte imprimé] / Melody Blythe Johnson, Auteur ; Mehrab Mehrvar, Auteur . - 2008 . - p. 6525–6537. Chemical engineering Langues : Anglais (eng) in Industrial & engineering chemistry research > Vol. 47 N°17 (Septembre 2008) . - p. 6525–6537 Mots-clés : Aqueous  metronidazole  Kinetic  model  UV/H2O2  process Résumé : A kinetic model was developed to predict the removal of aqueous metronidazole utilizing the UV/H2O2 process. The rate constant for the reaction between metronidazole and hydroxyl radicals was determined to be 1.98 × 109 M−1 s−1. The model was able to predict an optimal initial H2O2 dose and the inhibitory effects of high H2O2 doses and bicarbonate ions in the aqueous solution. Simulations were performed for three different photoreactors treating a 6 μM solution of metronidazole at various influent H2O2 doses and photoreactor radii. The predicted removal rates of metronidazole were 4.9−13% and 14−41% for the single-lamp and multilamp photoreactors, respectively. Selection of a photoreactor radius for maximum metronidazole removal varied with influent H2O2 concentration. The lowest operational cost of $0.05 per mmol removed was projected for the multilamp photoreactor. Operationally, it was cost-effective to utilize higher UV lamp output (36W), while keeping influent H2O2 concentration low (25 mg/L). En ligne : http://pubs.acs.org/doi/abs/10.1021/ie071637v