Article : texte imprimé

Nonlinear model identification for temperature control in single wafer rapid thermal processing

Wonhui Cho, Auteur ; Thomas F. Edgar, Auteur |

Dans Industrial & engineering chemistry research (Vol. 47 n°14, Juillet 2008)

Single wafer rapid thermal processing (RTP) has become one of the key technologies in semiconductor manufacturing due to its faster wafer processing with reduced thermal budget and precise control of processing conditions. As the standard size o[...]

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