Article : texte imprimé

Real-time end-point detection using modified principal component analysis for small open area SiO2 plasma etching

Kyounghoon Han, Auteur ; En Sup Yoon, Auteur |

Dans Industrial & engineering chemistry research (Vol. 47 n°11, Juin 2008)

Principal component analysis (PCA) was modified for real-time applications and applied to the end-point detection of small open area SiO2 plasma etching. Typically, the end point of plasma etching is determined from a few manually selected wavel[...]

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